发明名称 PATTERN DETERMINATION METHOD FOR IMPRINT MOLD, IMPRINT METHOD AND DEVICE
摘要 <p>In the present invention, in imprint processing carried out in an atmosphere which includes a compressed gas, a pattern is formed on a substrate with greater accuracy than the prior art. Provided is a determination method for determining the pattern of a mold using a computer, such mold being used in imprint processing for forming a pattern on an imprint material by carrying out the following: a step in which, in an atmosphere including a compressed gas which is liquefied by compression, an imprint material on a substrate and the pattern of a mold are pressed together; a step in which the imprint material is cured; and a step in which the imprint material and the mold are separated. In the pressing step, a condensed liquid, that is the result of the compressed gas between the imprint material and the mold liquefying and that has seeped into the imprint material, is separated from the imprint material after completion of the pressing step and causes the shrinkage of the pattern of the imprint material; the amount of this shrinkage is calculated; and the dimensions of a mold pattern are determined using the shrinkage amount.</p>
申请公布号 WO2015068215(A1) 申请公布日期 2015.05.14
申请号 WO2013JP79962 申请日期 2013.11.06
申请人 CANON KABUSHIKI KAISHA 发明人 TANABE MASAYUKI;YOSHIDA SETSUO;SAKAI KEITA;NAKANO HITOSHI
分类号 H01L21/027 主分类号 H01L21/027
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