MASK PATTERN GENERATION METHOD AND OPTICAL IMAGE CALCULATION METHOD

摘要

In a method for generating, with a computer, a pattern of a mask, a pattern on an object plane of a projection optical system is set, shifted plural pupil functions are generated, a matrix containing the generated plural pupil functions is defined, an image of the pattern on the object plane is calculated by generating a vector obtained by transposing and complex-conjugating a vector containing, as components, values of the pupil functions at origin coordinates on a pupil plane from among components of the matrix, and performing convolution integral between the pattern on the object plane and a Fourier transform of a product of the vector and the matrix, an assist pattern for the pattern on the object plane is generated using the calculated image, and a pattern of the mask including the pattern on the object plane and the assist pattern is generated.

主权项

1. A method for generating a pattern of a mask to be used for illuminating the mask with an illumination optical system and projecting an image of the pattern of the mask onto a substrate through a projection optical system, the method comprising the following steps being performed by a processor:
setting a pattern on an object plane of the projection optical system; shifting a pupil function representing a pupil of the projection optical system in accordance with a position of a point light source at coordinates on a pupil plane of the projection optical system for individual point light sources on the pupil plane, and generating shifted plural pupil functions; defining a matrix containing the generated plural pupil functions; calculating an image of the pattern on the object plane by generating a vector obtained by transposing and complex-conjugating a vector containing, as components, values of the pupil functions at origin coordinates on the pupil plane from among components of the matrix, and performing convolution integral between the pattern on the object plane and a Fourier transform of a product of the vector and the matrix; and generating, using the calculated image, an assist pattern for the pattern on the object plane, and generating a pattern of the mask including the pattern on the object plane and the assist pattern.