LOW TEMPERATURE RTP CONTROL USING IR CAMERA

摘要

Embodiments of the present invention generally relate to methods and apparatus for monitoring substrate temperature uniformity in a processing chamber, such as an RTP chamber. Substrate temperature is monitored using an infrared camera coupled to a probe having a wide-angle lens. The wide-angle lens is positioned within the probe and secured using a spring, and is capable of withstanding high temperature processing. The wide angle lens facilities viewing of substantially the entire surface of the substrate in a single image. The image of the substrate can be compared to a reference image to facilitate lamp adjustments, if necessary, to effect uniform heating of the substrate.

主权项

1. A process chamber, comprising:
a chamber body; a lamp array disposed in the chamber body; a lid disposed over the chamber body; a probe disposed through an opening in the chamber lid, the probe having a wide-angle lens array at a first end of the probe; and an infrared camera coupled to a second end of the probe.