发明名称 |
SMART DEVICE FABRICATION VIA PRECISION PATTERNING |
摘要 |
Embodiments involve smart device fabrication for semiconductor processing tools via precision patterning. In one embodiment, a method of manufacturing a semiconductor processing tool component includes providing a substrate of the semiconductor processing tool component, patterning the substrate to form a sensor directly on the substrate, and depositing a top layer over the sensor. The sensor may include, for example, a temperature or strain sensor. The method can also include patterning the substrate to form one or more of: heaters, thermistors, and electrodes on the substrate. In one embodiment, the method involves patterning a surface of the component oriented towards a plasma region inside of the semiconductor processing tool. |
申请公布号 |
US2015129574(A1) |
申请公布日期 |
2015.05.14 |
申请号 |
US201314077043 |
申请日期 |
2013.11.11 |
申请人 |
SUN Jennifer;CHEN Yikai;KANUNGO Biraja;FIROUZDOR Vahid |
发明人 |
SUN Jennifer;CHEN Yikai;KANUNGO Biraja;FIROUZDOR Vahid |
分类号 |
H05B1/02;C23C4/00;C23C4/12 |
主分类号 |
H05B1/02 |
代理机构 |
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代理人 |
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主权项 |
1. A method of manufacturing a semiconductor processing tool component, the method comprising:
providing a substrate of the semiconductor processing tool component; patterning the substrate to form a sensor directly on the substrate; and depositing a top layer over the sensor. |
地址 |
Mountain View CA US |