发明名称 SMART DEVICE FABRICATION VIA PRECISION PATTERNING
摘要 Embodiments involve smart device fabrication for semiconductor processing tools via precision patterning. In one embodiment, a method of manufacturing a semiconductor processing tool component includes providing a substrate of the semiconductor processing tool component, patterning the substrate to form a sensor directly on the substrate, and depositing a top layer over the sensor. The sensor may include, for example, a temperature or strain sensor. The method can also include patterning the substrate to form one or more of: heaters, thermistors, and electrodes on the substrate. In one embodiment, the method involves patterning a surface of the component oriented towards a plasma region inside of the semiconductor processing tool.
申请公布号 US2015129574(A1) 申请公布日期 2015.05.14
申请号 US201314077043 申请日期 2013.11.11
申请人 SUN Jennifer;CHEN Yikai;KANUNGO Biraja;FIROUZDOR Vahid 发明人 SUN Jennifer;CHEN Yikai;KANUNGO Biraja;FIROUZDOR Vahid
分类号 H05B1/02;C23C4/00;C23C4/12 主分类号 H05B1/02
代理机构 代理人
主权项 1. A method of manufacturing a semiconductor processing tool component, the method comprising: providing a substrate of the semiconductor processing tool component; patterning the substrate to form a sensor directly on the substrate; and depositing a top layer over the sensor.
地址 Mountain View CA US