发明名称 METHOD FOR PRODUCING GLASS PARTICULATE DEPOSIT AND METHOD FOR PRODUCING GLASS PREFORM
摘要 A production method for a glass particulate deposit which includes a deposition step in which, at least two liquid source material ejecting ports 31a for a glass source material 23 jetting out from a burner 22 are provided per one burner 22, the area of at least one liquid source material port 31a is 2.25×10−4 or less of the area of the flame forming part of the burner 22, the glass source material 23 is, in the form of a liquid thereof, supplied to each liquid material source port 31a, jetting gas ports 31b are arranged in such a manner that the inner periphery of the jetting gas port is positioned outside by 1.0 mm or less from the outer periphery of each liquid source material port 31a, and a gas is jetted out from each gas jetting port 31b.
申请公布号 US2015128650(A1) 申请公布日期 2015.05.14
申请号 US201414537004 申请日期 2014.11.10
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 ISHIHARA Tomohiro;YAMAZAKI Takashi
分类号 C03B37/014;C03B19/14;C03B37/018 主分类号 C03B37/014
代理机构 代理人
主权项 1. A production method for a glass particulate deposit which includes a deposition step where a starting rod and a burner for production of glass particles are installed in a reactor, a glass source material is introduced into the burner, the glass source material is subjected to flame thermal decomposition in the flame formed by the burner to thereby form glass particles, and the formed glass particles are deposited on the starting rod to produce a glass particulate deposit, wherein: in the deposition step, at least two ejecting ports are provided per one burner for ejecting the glass source material jetting out from the burner, the area of at least one ejecting port of those ejecting ports is 2.25×10−4 or less of the area of the flame forming part of the burner, the glass source material is, in the form of a liquid thereof, supplied to each of the ejecting ports, gas jetting ports are arranged in such a manner that the inner periphery of the gas jetting port is positioned outside by 1.0 mm or less from the outer periphery of the liquid material ejecting port, and a gas is jetted out from the gas jetting port.
地址 Osaka JP