发明名称 Transistor and Tunable Inductance
摘要 According to a first aspect embodiments provide a transistor including at least one gate region between at least one drain region and at least one source region, wherein a ratio between a width of the gate region and a length of the gate region exceeds 300.
申请公布号 US2015130556(A1) 申请公布日期 2015.05.14
申请号 US201314080132 申请日期 2013.11.14
申请人 Infineon Technologies AG 发明人 Bakalski Winfried
分类号 H03H11/28;H01L27/06 主分类号 H03H11/28
代理机构 代理人
主权项 1. A transistor, comprising: at least one gate region between at least one drain region and at least one source region, wherein a ratio between a width of the gate region and a length of the gate region exceeds 300.
地址 Neubiberg DE