发明名称 |
Transistor and Tunable Inductance |
摘要 |
According to a first aspect embodiments provide a transistor including at least one gate region between at least one drain region and at least one source region, wherein a ratio between a width of the gate region and a length of the gate region exceeds 300. |
申请公布号 |
US2015130556(A1) |
申请公布日期 |
2015.05.14 |
申请号 |
US201314080132 |
申请日期 |
2013.11.14 |
申请人 |
Infineon Technologies AG |
发明人 |
Bakalski Winfried |
分类号 |
H03H11/28;H01L27/06 |
主分类号 |
H03H11/28 |
代理机构 |
|
代理人 |
|
主权项 |
1. A transistor, comprising:
at least one gate region between at least one drain region and at least one source region, wherein a ratio between a width of the gate region and a length of the gate region exceeds 300. |
地址 |
Neubiberg DE |