| 发明名称 |
SHOWERHEAD AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME |
| 摘要 |
A showerhead includes a body configured to receive a reaction gas, a nozzle on the body configured to inject the reaction gas to a substrate, and a plurality of conducting members in thermal contact with the body to conduct heat generated from the substrate. |
| 申请公布号 |
US2015129132(A1) |
申请公布日期 |
2015.05.14 |
| 申请号 |
US201414339650 |
申请日期 |
2014.07.24 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LIM Hong-Taek;KIM Ki-Kone;KIM Ho-Jun;BAE Jong-Yong;KIM Do-Hyung;WON Jai-Hyung;LEE Seung-Moo |
| 分类号 |
C23C16/455;C23C16/46 |
主分类号 |
C23C16/455 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A showerhead, comprising:
a body configured to receive a reaction gas; a nozzle on the body configured to inject the reaction gas to a substrate; and a plurality of conducting members in thermal contact with the body to conduct heat generated from the substrate. |
| 地址 |
Suwon-si KR |
