APPARATUS FOR CLEANING A SUBSTRATE

摘要

An apparatus for cleaning a substrate includes a substrate transferring unit configured to support a substrate at a polar angle from a first direction, and transfer the substrate along a second direction orthogonal to the first direction. A cleaning unit is disposed on the substrate transferring unit. The cleaning unit includes a plurality of two-fluid nozzles. The cleaning unit has an azimuth angle from the first direction. The two-fluid nozzles mix a cleaning solution and compressed gas together and spray the mixture.

主权项

1. An apparatus for cleaning a substrate, comprising:
a substrate transferring unit configured to support a substrate at a polar angle from a first direction, and transfer the substrate along a second direction orthogonal to the first direction; and a cleaning unit disposed on the substrate transferring unit, wherein the cleaning unit comprises a plurality of two-fluid nozzles, and wherein the cleaning unit has an azimuth angle from the first direction, and the two-fluid nozzles are configured to mix a cleaning solution and compressed gas together and spray the mixture.