发明名称 GRINDING DEVICE OF SEMICONDUCTOR SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To provide a grinding device of a semiconductor substrate which is installed in a space-saving manner and achieves low costs.SOLUTION: The grinding device of a semiconductor substrate includes a substrate transfer part 10 having a substrate transfer device 100 for transferring a substrate W among an indexer part, a substrate grinding part, a substrate polishing part, and a substrate cleaning part. The substrate transfer device 100 includes: a hand extending in a horizontal direction H; a substrate support part which is recessed on an upper surface of the hand and may support a periphery of the substrate W; and a substrate holding part which is disposed on a lower surface of the hand and may hold the periphery of the substrate W. A portion of the substrate transfer part 10, which is located below the hand, is maintained in a wet state.</p>
申请公布号 JP2015092520(A) 申请公布日期 2015.05.14
申请号 JP20130231644 申请日期 2013.11.08
申请人 TOKYO SEIMITSU CO LTD 发明人 FUKUHARA KEISUKE
分类号 H01L21/304;B65G49/07;H01L21/677 主分类号 H01L21/304
代理机构 代理人
主权项
地址