| 发明名称 |
DEVICE AND METHOD FOR THE SURFACE TREATMENT OF A SUBSTRATE AND METHOD FOR PRODUCING AN OPTOELECTRONIC COMPONENT |
| 摘要 |
Various embodiments may relate to a device for the surface treatment of a substrate, including a processing head, which is mounted rotatably about an axis of rotation, and which comprises multiple gas outlets, which are at least partially implemented on a radial outer edge of the processing head. |
| 申请公布号 |
US2015132872(A1) |
申请公布日期 |
2015.05.14 |
| 申请号 |
US201314397207 |
申请日期 |
2013.04.26 |
| 申请人 |
OSRAM GmbH |
发明人 |
Bauer Juergen;Doell Gerhard;Bauer Klaus-Dieter;Erhard Philipp;Vollkommer Frank |
| 分类号 |
C23C16/455;H01L51/00;H01L51/44;H01L51/52;H01L51/56 |
主分类号 |
C23C16/455 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A device for the surface treatment of a substrate, comprising a processing head, which is mounted rotatably about an axis of rotation, and which comprises multiple gas outlets, which are at least partially implemented on a radial outer edge of the processing head. |
| 地址 |
Muenchen DE |
