| 发明名称 |
Ultraviolet Curing Apparatus And Ultraviolet Curing Method Thereof |
| 摘要 |
An ultraviolet curing apparatus includes a chamber, a gas flow generator, and an ultraviolet lamp. The gas flow generator includes a top liner and a bottom liner coupled to each other. The top liner and the bottom liner are disposed in the chamber, and are made of low-coefficient of thermal expansion material. The ultraviolet lamp is disposed on the chamber and is configured for providing ultraviolet light. |
| 申请公布号 |
US2015132973(A1) |
申请公布日期 |
2015.05.14 |
| 申请号 |
US201314079945 |
申请日期 |
2013.11.14 |
| 申请人 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
发明人 |
Hung Teng-Da;Hsieh Liang-Chang;Lin Chun-Lung;Chi Hsin-Hung;Chu Yun-Wen;Su Jiun-Wei |
| 分类号 |
H01L21/324;H01L21/67;H01L21/683 |
主分类号 |
H01L21/324 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An ultraviolet curing apparatus, comprising:
a chamber; a gas flow generator comprising a top liner and a bottom liner coupled to each other, wherein the top liner and the bottom liner are disposed in the chamber, and are made of low-coefficient of thermal expansion material; and an ultraviolet lamp disposed on the chamber for providing ultraviolet light. |
| 地址 |
Hsinchu TW |
