发明名称 METHOD AND APPARATUS FOR FORMING A GRAPHENE PATTERN USING PEEL-OFF TECHNIQUE
摘要 The present invention relates to a graphene pattern forming method using a delamination technique employing a polymer stamp. The technique is adequate for forming a graphene pattern having a an arbitrary target pattern. According to the present invention, a portion of a graphene layer formed on a substrate is physically and selectively delaminated using the polymer stamp to simply and easily form a desired graphene pattern having a uniform line width on the substrate. Also, a portion of the graphene layer formed on the substrate is physically and selectively delaminated in a roll-to-roll manner using a rotating body stamp or by using a stamp having a large area to simply and easily form a desired graphene pattern having a uniform line width on the a substrate having a large area.
申请公布号 US2015132488(A1) 申请公布日期 2015.05.14
申请号 US201214117582 申请日期 2012.05.10
申请人 Lee Sun Sook;Jung Daesung;Kim Han Sun;An Ki-Seok;Chung Taek-Mo;Kim Chang Gyoun;Lee Young Kuk 发明人 Lee Sun Sook;Jung Daesung;Kim Han Sun;An Ki-Seok;Chung Taek-Mo;Kim Chang Gyoun;Lee Young Kuk
分类号 B32B43/00;C23C16/56;C23C16/26 主分类号 B32B43/00
代理机构 代理人
主权项 1. A method for forming a graphene pattern layer using a peel-off technique, the method comprising: forming a graphene layer on a substrate; forming a graphene peeling-off layer on a pattern surface of a polymer stamp, the polymer stamp having embossed patterns; aligning the pattern surface of the polymer stamp with a target position of the graphene layer to contact with each other; and separating the polymer stamp from the substrate to selectively peel off a portion of the graphene layer adhered on the respective embossed patterns of the polymer stamp from the substrate, thereby forming the graphene pattern layer.
地址 Daejeon KR