发明名称 |
ARC CHAMBER WITH MULTIPLE CATHODES FOR AN ION SOURCE |
摘要 |
An apparatus for extending the useful life of an ion source, comprising an arc chamber containing a plurality of cathodes to be used sequentially and a plurality of repellers to protect cathodes when not in use. The arc chamber includes an arc chamber housing defining a reaction cavity, gas injection openings, a plurality of cathodes, and at least one repeller element. A method for extending the useful life of an ion source includes providing power to a first cathode of an arc chamber in an ion source, operating the first cathode, detecting a failure or degradation in performance of the first cathode, energizing a second cathode, and continuing operation of the arc chamber with the second cathode. |
申请公布号 |
US2015130353(A1) |
申请公布日期 |
2015.05.14 |
申请号 |
US201414578575 |
申请日期 |
2014.12.22 |
申请人 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
发明人 |
LIN Chin-Tsung;HSIEH Hsiao-Yin;HUANG Chi-Hao;CHOU Hong-Shing;WANG Yeh-Chieh |
分类号 |
H01J37/08;H01J37/244;H01J37/317 |
主分类号 |
H01J37/08 |
代理机构 |
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代理人 |
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主权项 |
1. An apparatus for extending the useful life of an ion source comprising:
an arc chamber having a reaction cavity; a repeller pivotally mounted to rotate from a first position extending across the reaction cavity to a second position not extending across the reaction cavity; and a first cathode, configured to be covered by the repeller when the repeller is in the first position. |
地址 |
Hsin-Chu TW |