| 发明名称 |
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY MEDIUM |
| 摘要 |
A method for cleaning a substrate includes supplying to a substrate a film-forming processing liquid which includes a volatile component and forms a film on the substrate, vaporizing the volatile component in the film-forming processing liquid such that the film-forming processing liquid solidifies or cures on the substrate and forms a processing film on the substrate, supplying to the substrate having the processing film a strip-processing liquid which strips the processing film from the substrate, and supplying to the processing film formed on the substrate a dissolving-processing liquid which dissolves the processing film after the supplying of the strip-processing liquid. |
| 申请公布号 |
US2015128994(A1) |
申请公布日期 |
2015.05.14 |
| 申请号 |
US201414539174 |
申请日期 |
2014.11.12 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KANEKO Miyako;TANOUCHI Keiji;ORII Takehiko;KANNO Itaru;AIBARA Meitoku;TANAKA Satoru |
| 分类号 |
H01L21/02;B08B3/02;B08B3/08;H01L21/67;H01L21/677 |
主分类号 |
H01L21/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for cleaning a substrate, comprising:
supplying to a substrate a film-forming processing liquid which includes a volatile component and forms a film on the substrate; vaporizing the volatile component in the film-forming processing liquid such that the film-forming processing liquid solidifies or cures on the substrate and forms a processing film on the substrate; supplying to the substrate having the processing film a strip-processing liquid which strips the processing film from the substrate; and supplying to the processing film formed on the substrate a dissolving-processing liquid which dissolves the processing film after the supplying of the strip-processing liquid. |
| 地址 |
Minato-ku JP |
