发明名称 エピタキシャル構造体の製造方法
摘要 <p>The invention relates to a preparation method for an epitaxial structure body. The preparation method concretely comprises the following steps: providing a substrate which has an epitaxial growth face supporting the growth of an epitaxial layer; arranging a carbon nanotube layer on the epitaxial growth face of the substrate; growing the epitaxial layer on the epitaxial growth face of the substrate to form a primary epitaxial structure body; and removing the carbon nanotube layer in the primary epitaxial structure body. The preparation method for the epitaxial structure body provided by the invention is simple in operation and low in cost, and causes no pollution to the surface of the substrate.</p>
申请公布号 JP5718209(B2) 申请公布日期 2015.05.13
申请号 JP20110238664 申请日期 2011.10.31
申请人 发明人
分类号 C30B25/04;C23C16/34;H01L21/205 主分类号 C30B25/04
代理机构 代理人
主权项
地址