| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a film deposition apparatus or a film deposition method capable of uniformly depositing multi-layered film of various kinds on a large substrate without bias, and to provide a film deposition apparatus or a film deposition method capable of precisely controlling the composition of a thin film formed of a plurality of kinds of materials. <P>SOLUTION: A plurality of vapor deposition source groups having a plurality of vapor deposition sources aligned in the radial direction are arranged in a radial shape with respect to a rotary shaft. Film deposition is executed while revolving the substrate with respect to the rotary shaft, rotating a table with the vapor deposition source groups being arranged thereon, or performing both the revolution and the rotation. In this condition, the linear velocity is different at a part of small radius of gyration from that at a part of large radius of gyration, and in order to unify the film deposition velocity, the vapor deposition sources aligned on the table in the radial direction may be controlled so that the vaporization rate becomes larger as outwardly forwarded. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
