摘要 |
<p>Disclosed is a method for manufacturing an optical element (22), which includes a step wherein an aluminum nitride single crystal layer (12) is formed on an aluminum nitride seed substrate (11) having an aluminum nitride single crystal surface (11 a) as the topmost surface, a laminated body (2) for an optical element is manufactured by forming an optical element layer (20) on the aluminum nitride single crystal layer (12), and the aluminum nitride seed substrate (11) is removed from the laminated body (2). With the method of the present invention, an optical element having, as a substrate, an aluminum nitride single crystal layer having a high ultraviolet transmittance, and furthermore, a low dislocation density is provided.</p> |