| 摘要 |
The present invention relates to a substrate cleaning apparatus and a cleaning brush module therefor. The substrate cleaning apparatus contacts a substrate to clean the substrate and comprises: a plurality of substrate support units to contact edges of the substrate to position the substrate to a prescribed location and support the substrate; and a first brush module. The first brush module comprises: a first rotational shaft to be rotated by a first driving motor; a first cleaning brush formed of a liquid absorbing material to enclose one or more portions of the first rotational shaft to rotate the substrate while contacting the substrate; a first support bracket formed to extend in a longitudinal direction of the cleaning brush to support a first end portion support unit rotatably supporting an outer end portion of the rotational shaft; and a first brush end control unit to control a length between the first support bracket and the first end portion support unit. The first brush end control unit which adjusts the length between the first end portion support unit and an end portion of the first support bracket compensates for sagging of the cleaning brush by lifting the first end portion support unit. Thus, the cleaning brush makes a uniform contact with the surface of the substrate across the entire length of the cleaning brush to spotlessly clean the substrate. |
