发明名称 半導体装置およびその製造方法
摘要 <p>A semiconductor device includes a plurality of MOS transistors and wiring connected to a source electrode or a drain electrode of the plurality of MOS transistors and, the wiring being provided in the same layer as the source electrode and the drain electrode in a substrate, or in a position deeper than a surface of the substrate.</p>
申请公布号 JP5717943(B2) 申请公布日期 2015.05.13
申请号 JP20080174605 申请日期 2008.07.03
申请人 发明人
分类号 H01L21/8242;H01L21/3205;H01L21/768;H01L23/522;H01L27/10;H01L27/105;H01L27/108;H01L29/417;H01L29/423;H01L29/49 主分类号 H01L21/8242
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