| 摘要 |
<p>A polishing pad used in a glass substrate mirror-polishing process, characterized in that: the polishing pad has multiple open holes on the main surface that contacts the glass substrate; one open hole and another open hole adjacent thereto are separated by a partition; and of the side surfaces of said partition, an inclined section is provided on the side surface on the side of the other open hole and the inclined section has a minimum radius of curvature 20 - 100 µm. Said polishing pad provides, for example, a polishing pad with which polishing liquid components do not accumulate easily in the open holes while the mirror-finish processing rate is maintained.</p> |
