| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer capable of forming a high-sensitivity resist film and excellent in solvent solubility when it is formed into a resist composition. <P>SOLUTION: The polymer (P) is obtained by radical polymerization and satisfying the following formula (1) P[α<SB>A</SB>]/P[α<SB>B</SB>]≤0.7 when subjected to gel permeation chromatography (GPC). In formula (1), P[α<SB>A</SB>] is the ratio of the peak area from the peak start molecular weight to the peak top molecular weight to the total polymer peak area when the polymer (P) is subjected to gel permeation chromatography, and P[α<SB>B</SB>] is the ratio of the peak area from the peak top molecular weight to the peak end molecular weight to the total polymer peak area when polymer (P) is subjected to gel permeation chromatography. <P>COPYRIGHT: (C)2010,JPO&INPIT |
