| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a cleaning apparatus in which a larger amount of gas such as oxygen can be thoroughly spread in a used treating liquid. <P>SOLUTION: The cleaning apparatus for cleaning the treating liquid used in a processing machine includes: a liquid storage tank 10; bubble production mechanisms 11, 21, 22 for producing bubbles in the used treating liquid and discharging the bubble-containing used treating liquid; and a supply part 26 for guiding the bubble-containing used treating liquid to be discharged from the bubble production mechanisms to the liquid storage tank 10 and supplying the guided bubble-containing used treating liquid to the liquid storage tank 10 while spouting the guided bubble-containing used treating liquid toward the bottom of the liquid storage tank. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
