低欠陥の一体型窓を有する化学機械研磨パッド及び当該化学機械研磨パッドを用いて基体を化学機械研磨する方法

摘要

PROBLEM TO BE SOLVED: To provide a chemical mechanical polishing pad capable of reducing a problem of leakage of a plug-in-place window, and a problem of defect of polishing accompanied with a built-in window.SOLUTION: A chemical mechanical polishing pad includes a polishing layer having a polishing face and a built-in window. The built-in window is integrated with the polishing layer, and the built-in window is a polyurethane reaction product of a hardening agent and isocyanate terminal polymer polyol. The hardening agent contains a curable amine portion forming the built-in window by reacting to an unreacted NCO portion included in the isocyanate terminal polymer polyol. The hardening agent and the isocyanate terminal polymer polyol are provided at a stoichiometrical ratio of the amine portion and the unreacted NCO portion of 1:1-1.25. The built-in window has porosity of less than 0.1 volume %, and the built-in window shows compression permanent distortion of 5-25%.