| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition that can give a cured film having high sensitivity, high durability against a stripping solution or NMP, good adhesiveness to a transparent electrode film or metal, and excellent dry etching durability, and hardly causing problems in display even in a display device. <P>SOLUTION: The positive photosensitive resin composition comprises: (component A) a copolymer having at least (a1) a structural unit having a residue of an acid group protected by an acid decomposable group and (a2) a structural unit having a crosslinking group; (component B) a copolymer having no structural unit having a residue of an acid group protected with an acid decomposable group but having at least (b1) a structural unit having an acid group and (b2) a structural unit having a crosslinking group; (component C) a photo-acid generator; and (component D) a solvent. <P>COPYRIGHT: (C)2013,JPO&INPIT |
