发明名称 |
Apparatus for measuring transmissivity of patterned glass substrate |
摘要 |
An apparatus for measuring transmissivity of a patterned glass substrate. A beam radiator radiates a laser beam. A collimation lens collimates the laser beam radiated from the laser beam radiator. A beam expander expands a size of the laser beam collimated by the collimation lens. A detector has a light-receiving section, which receives the laser beam that has passed through the patterned glass substrate after having been expanded by the beam expander. A measuring instrument measures a transmissivity of the patterned glass substrate using the laser beam received by the detector. |
申请公布号 |
US9030664(B2) |
申请公布日期 |
2015.05.12 |
申请号 |
US201113334845 |
申请日期 |
2011.12.22 |
申请人 |
Samsung Corning Precision Materials Co., Ltd. |
发明人 |
Park Kyungwook;Kwon YoonYoung;Choi Jaeyoung;Lee Jongsung;Lee Hoikwan;Cho Seo-Yeong;Yoon Kyungmin |
分类号 |
G01N21/00;G01N21/958;G01N21/59 |
主分类号 |
G01N21/00 |
代理机构 |
Lerner, David, Littenberg, Krumholz & Mentlik, LLP |
代理人 |
Lerner, David, Littenberg, Krumholz & Mentlik, LLP |
主权项 |
1. A method for measuring transmissivity of a patterned glass substrate, comprising:
radiating a laser beam having a size, at a single wavelength of 550 nm; collimating the laser beam with a collimation lens; expanding the size of the collimated laser beam; passing the expanded laser beam through a glass substrate having a plurality of pattern units on which the expanded collimated laser beam is incident; receiving, at a detector having a light-receiving section at least twice as large as a size of the expanded laser beam that is incident on the patterned glass substrate, the expanded laser beam that is passed through the patterned glass substrate; and measuring transmissivity of the patterned glass substrate based on the received laser beam; wherein the detector is 5 mm or less from a rear end of the patterned glass substrate. |
地址 |
KR |