发明名称 Apparatus for measuring transmissivity of patterned glass substrate
摘要 An apparatus for measuring transmissivity of a patterned glass substrate. A beam radiator radiates a laser beam. A collimation lens collimates the laser beam radiated from the laser beam radiator. A beam expander expands a size of the laser beam collimated by the collimation lens. A detector has a light-receiving section, which receives the laser beam that has passed through the patterned glass substrate after having been expanded by the beam expander. A measuring instrument measures a transmissivity of the patterned glass substrate using the laser beam received by the detector.
申请公布号 US9030664(B2) 申请公布日期 2015.05.12
申请号 US201113334845 申请日期 2011.12.22
申请人 Samsung Corning Precision Materials Co., Ltd. 发明人 Park Kyungwook;Kwon YoonYoung;Choi Jaeyoung;Lee Jongsung;Lee Hoikwan;Cho Seo-Yeong;Yoon Kyungmin
分类号 G01N21/00;G01N21/958;G01N21/59 主分类号 G01N21/00
代理机构 Lerner, David, Littenberg, Krumholz & Mentlik, LLP 代理人 Lerner, David, Littenberg, Krumholz & Mentlik, LLP
主权项 1. A method for measuring transmissivity of a patterned glass substrate, comprising: radiating a laser beam having a size, at a single wavelength of 550 nm; collimating the laser beam with a collimation lens; expanding the size of the collimated laser beam; passing the expanded laser beam through a glass substrate having a plurality of pattern units on which the expanded collimated laser beam is incident; receiving, at a detector having a light-receiving section at least twice as large as a size of the expanded laser beam that is incident on the patterned glass substrate, the expanded laser beam that is passed through the patterned glass substrate; and measuring transmissivity of the patterned glass substrate based on the received laser beam; wherein the detector is 5 mm or less from a rear end of the patterned glass substrate.
地址 KR
您可能感兴趣的专利