发明名称 Structure including gallium nitride substrate and method of manufacturing the gallium nitride substrate
摘要 A structure includes a silicon substrate, a plurality of silicon rods on the silicon substrate, a silicon layer on the plurality of silicon rods, and a GaN substrate on the silicon layer.
申请公布号 US9029860(B2) 申请公布日期 2015.05.12
申请号 US201313848281 申请日期 2013.03.21
申请人 Samsung Electronics Co., Ltd. 发明人 Wenxu Xianyu;Kim Yeon-hee;Moon Chang-youl;Park Yong-young
分类号 H01L29/00;H01L21/02;H01L29/20 主分类号 H01L29/00
代理机构 Harness, Dickey & Pierce 代理人 Harness, Dickey & Pierce
主权项 1. A structure comprising: a plurality of silicon rods on a silicon substrate; a silicon layer on the plurality of silicon rods, the silicon layer contacting each of the plurality of silicon rods; and a gallium nitride (GaN) substrate on the silicon layer.
地址 Gyeonggi-Do KR