发明名称 |
Structure including gallium nitride substrate and method of manufacturing the gallium nitride substrate |
摘要 |
A structure includes a silicon substrate, a plurality of silicon rods on the silicon substrate, a silicon layer on the plurality of silicon rods, and a GaN substrate on the silicon layer. |
申请公布号 |
US9029860(B2) |
申请公布日期 |
2015.05.12 |
申请号 |
US201313848281 |
申请日期 |
2013.03.21 |
申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Wenxu Xianyu;Kim Yeon-hee;Moon Chang-youl;Park Yong-young |
分类号 |
H01L29/00;H01L21/02;H01L29/20 |
主分类号 |
H01L29/00 |
代理机构 |
Harness, Dickey & Pierce |
代理人 |
Harness, Dickey & Pierce |
主权项 |
1. A structure comprising:
a plurality of silicon rods on a silicon substrate; a silicon layer on the plurality of silicon rods, the silicon layer contacting each of the plurality of silicon rods; and a gallium nitride (GaN) substrate on the silicon layer. |
地址 |
Gyeonggi-Do KR |