Multi-source plasma focused ion beam system

摘要

The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.

主权项

1. A method of charged particle beam processing, comprising:
providing an ion beam system having a first gas supply and a second gas supply, the first and second gas supplies being selectively connected to an ionized plasma chamber of an ion source for producing ions of a first type or ions of a second type, respectively, the ion beam system including focusing optics for forming a beam of ions extracted from the plasma chamber; selectively causing a gas from the first gas supply to enter the plasma chamber; and processing a work piece inside a vacuum chamber using a beam of ions of the first type extracted from the plasma chamber; selectively causing a gas from the second gas supply to enter the plasma chamber; and processing the work piece using a beam of ions of the second type extracted from the plasma chamber, in which the work piece is not removed from the vacuum chamber and the vacuum chamber is not exposed to atmosphere between processing the work piece using the beam of ions of a first type and processing the work piece using the beam of ions of a second type and a circuitry is used to couple an antenna to an electrical source to substantially reduce oscillations in the ionized plasma.