发明名称 Thin film transistor and shift register
摘要 Thin film transistors having a high current drive capability and a suitable threshold voltage are provided. The thin film transistor includes a gate electrode, an insulating layer formed on the gate electrode, a semiconductor layer formed on the insulating layer, and source/drain electrodes formed on the semiconductor layer. The semiconductor layer includes a plurality of regions separated from each other in a longitudinal direction of the source/drain electrodes.
申请公布号 US9029861(B2) 申请公布日期 2015.05.12
申请号 US201113809930 申请日期 2011.05.20
申请人 Sharp Kabushiki Kaisha 发明人 Kikuchi Tetsuo;Kataoka Yoshiharu;Tanaka Shinya;Shimada Junya;Yamasaki Chikao
分类号 H01L29/10;H01L29/76;H01L31/036;H01L31/112;H01L29/786;H01L27/12;H01L27/02 主分类号 H01L29/10
代理机构 Keating & Bennett, LLP 代理人 Keating & Bennett, LLP
主权项 1. A shift register comprising: a plurality of thin film transistors, wherein the plurality of thin film transistors of the shift register include a first thin film transistor configured to drive a gate line of a liquid crystal display, a second thin film transistor, and at least one additional thin film transistor, the first thin film transistor includes: a first gate electrode,a first insulating layer formed on the first gate electrode,a first semiconductor layer formed on the first insulating layer, anda first plurality of source/drain electrodes formed on the first semiconductor layer, whereinthe first semiconductor layer includes a first plurality of regions separated from each other in a first direction perpendicular to a first current flow in the first semiconductor layer between corresponding ones of the first plurality of source/drain electrodes, andeach of the first plurality of regions of the first thin film transistor has a first channel width, the second thin film transistor includes: a second gate electrode,a second insulating layer formed on the second gate electrode,a second semiconductor layer formed on the second insulating layer, anda second plurality of source/drain electrodes formed on the second semiconductor layer, whereinthe second semiconductor layer includes a second plurality of regions separated from each other in a second direction perpendicular to a second current flow in the second semiconductor layer between corresponding ones of the second plurality of source/drain electrodes, andeach of the second plurality of regions of the second thin film transistor has a second channel width which is a smallest width of respective channel widths of the plurality of thin film transistors of the shift register excluding the first thin film transistor, andthe first channel width is substantially the same as the second channel width.
地址 Osaka JP