发明名称 |
Electrode foil and electronic device |
摘要 |
There is provided an electrode foil, which can show superior light scattering, while preventing short circuit between electrodes. The electrode foil of the present invention comprises a metal foil having a thickness of from 1 μm to 250 μm, wherein the electrode foil comprises, on at least one outermost surface thereof, a light-scattering surface having a Pv/Pp ratio of 2.0 or higher, wherein the Pv/Pp ratio is a ratio of a maximum profile valley depth Pv of a profile curve to a maximum profile peak height Pp of the profile curve as measured in a rectangular area of 181 μm×136 μm in accordance with JIS B 0601-2001. |
申请公布号 |
US9029885(B2) |
申请公布日期 |
2015.05.12 |
申请号 |
US201213981804 |
申请日期 |
2012.12.26 |
申请人 |
Mitsui Mining & Smelting Co., Ltd. |
发明人 |
Matsuura Yoshinori;Kitajima Nozomu;Nakamura Toshimi;Myoi Masaharu |
分类号 |
H01L33/00;H01L33/38;H05B33/26;H01L31/0224;H01L51/00;H01L31/0392;H01L31/056;H01L33/40;H01L33/42 |
主分类号 |
H01L33/00 |
代理机构 |
The Webb Law Firm |
代理人 |
The Webb Law Firm |
主权项 |
1. An electrode foil comprising a metal foil having a thickness of from 1 μm to 250 μm, wherein the electrode foil comprises, on at least one outermost surface thereof, a light-scattering surface having a Pv/Pp ratio of 2.0 or higher, wherein the Pv/Pp ratio is a ratio of a maximum profile valley depth Pv of a profile curve to a maximum profile peak height Pp of the profile curve as measured in a rectangular area of 181 μm×136 μm in accordance with JIS B 0601-2001, and wherein the light-scattering surface has an arithmetic average roughness Ra of 60 nm or less as measured in accordance with JIS B 0601-2001. |
地址 |
Tokyo JP |