发明名称 |
Substrate processing apparatus |
摘要 |
When processing such as SiC epitaxial growth is performed at an ultrahigh temperature of 1500° C. to 1700° C., a film-forming gas can be decreased to heat-resistant temperature of a manifold and film quality uniformity can be improved. A substrate processing apparatus includes a reaction chamber for processing a plurality of substrates, a boat for holding the plurality of substrates, a gas supply nozzle for supplying a film-forming gas to the plurality of substrates, an exhaust port for exhausting the film-forming gas supplied into the reaction chamber, a heat exchange part which defines a second flow path narrower than a first flow path defined by an inner wall of the reaction chamber and the boat, and a gas discharge part installed under the lowermost substrate of the plurality of substrates. |
申请公布号 |
US9028614(B2) |
申请公布日期 |
2015.05.12 |
申请号 |
US201213406056 |
申请日期 |
2012.02.27 |
申请人 |
Hitachi Kokusai Electric Inc. |
发明人 |
Hara Daisuke;Itoh Takeshi;Fukuda Masanao;Yamaguchi Takatomo;Hiramatsu Hiroaki;Saido Shuhei;Sasaki Takafumi |
分类号 |
C23C16/455;C23C16/458;C23C16/46;H01L21/67;C30B25/08;C30B25/14;C30B29/36;H01L21/673;H01L21/677;C23C16/32;C23C16/44 |
主分类号 |
C23C16/455 |
代理机构 |
Volpe and Koenig, P.C. |
代理人 |
Volpe and Koenig, P.C. |
主权项 |
1. A substrate processing apparatus comprising:
a reaction chamber configured to process a plurality of substrates; a boat configured to hold the plurality of substrates; a boat heat-insulating part having a cylindrical shape disposed under the boat; a gas supply nozzle including a gas supply port configured to supply a film-forming gas to the plurality of substrates; an exhaust port configured to exhaust the film-forming gas from the reaction chamber; a heat exchange part installed under the boat heat-insulating part wherein the heat exchange part defining a second flow path narrower than a first flow path defined by an inner side wall of the reaction chamber and the boat and configured to exchange heat with the film-forming gas supplied into the reaction chamber, the heat exchange part comprising a first heat exchange part having a cylindrical shape, the first heat exchange part being spaced apart from the boat heat-insulating part and surrounding at least a portion of a side surface of the boat heat-insulating part, wherein an upper end portion of the heat exchange part is lower than a lowermost portion of the boat and an upper end of the first heat exchange part is higher than that of the boat heat-insulating part; and a gas discharge part installed between the lowermost portion of the boat and a top portion of the boat heat-insulating part, the gas discharge part including a plurality of columns defining a space between the lowermost portion of the boat and the heat exchange part. |
地址 |
Tokyo JP |