发明名称 Electrostatic chuck
摘要 An electrostatic chuck comprises: a dielectric substrate having a protrusion and a planar surface part. The protrusion is formed on a major surface of the dielectric substrate. An adsorption target material is mounted on the major surface. The planar surface part is formed in a periphery of the protrusion. The dielectric substrate is formed from a polycrystalline ceramics sintered body. A top face of the protrusion is a curved surface, and a first recess is formed in the top face to correspond to crystal grains that appear on the surface. The planar surface part has a flat part, and a second recess is formed in the flat part. A depth dimension of the first recess is greater than a depth dimension of the second recess. The electrostatic chuck can suppress the generation of particles and can easily recover a clean state of the electrostatic chuck surface.
申请公布号 US9030798(B2) 申请公布日期 2015.05.12
申请号 US201113816037 申请日期 2011.08.11
申请人 Toto Ltd. 发明人 Ishikawa Kaduko;Yonezawa Junji;Aoshima Toshihiro;Hayashida Yoshihide
分类号 H01L21/683;B32B3/30;B32B5/14;H01L21/687;H02N13/00;B23Q3/15 主分类号 H01L21/683
代理机构 Carrier Blackman & Associates, P.C. 代理人 Carrier Blackman & Associates, P.C. ;Carrier Joseph P.;Blackman William D.
主权项 1. An electrostatic chuck, comprising a dielectric substrate having a protrusion and a planar surface part, the protrusion being formed on a major surface of the dielectric substrate, an adsorption target material being mounted on the major surface, the planar surface part being formed in a periphery of the protrusion, the dielectric substrate being formed from a polycrystalline ceramics sintered body, a top face of the protrusion being a curved surface, a first recess being formed in the top face to correspond to crystal grains that appear on the surface, the planar surface part having a flat part, a second recess being formed in the flat part, and a depth dimension of the first recess being greater than a depth dimension of the second recess.
地址 Fukuoka JP