发明名称 Semiconductor device and method of manufacture thereof
摘要 A semiconductor device and a method of making a semiconductor device are disclosed. The semiconductor device comprises a redistribution layer arranged over a chip, the redistribution layer comprising a first redistribution line. The semiconductor further comprises an isolation layer disposed over the redistribution layer, the isolation layer having a first opening forming a first pad area and a first interconnect located in the first opening and in contact with the first redistribution line. The redistribution line in the first pad area is arranged orthogonal to a first direction to a neutral point of the semiconductor device.
申请公布号 US9030019(B2) 申请公布日期 2015.05.12
申请号 US201012967962 申请日期 2010.12.14
申请人 Infineon Technologies AG 发明人 Meyer Thorsten;Heitzer Ludwig
分类号 H01L23/48;H01L23/31;H01L23/00 主分类号 H01L23/48
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A semiconductor device comprising: a redistribution layer disposed on a chip, the redistribution layer comprising a first redistribution line; an isolation layer disposed on the redistribution layer, the isolation layer having a first opening forming a first pad area; and a first interconnect located in the first opening and in contact with the first redistribution line, wherein the first redistribution line in the first pad area is routed orthogonal to a first direction to a central point and not routed parallel to an edge of the semiconductor device, and wherein the central point is a central point in a plane parallel to a main surface of the semiconductor device.
地址 Neubiberg DE