发明名称 |
Semiconductor device and method of manufacture thereof |
摘要 |
A semiconductor device and a method of making a semiconductor device are disclosed. The semiconductor device comprises a redistribution layer arranged over a chip, the redistribution layer comprising a first redistribution line. The semiconductor further comprises an isolation layer disposed over the redistribution layer, the isolation layer having a first opening forming a first pad area and a first interconnect located in the first opening and in contact with the first redistribution line. The redistribution line in the first pad area is arranged orthogonal to a first direction to a neutral point of the semiconductor device. |
申请公布号 |
US9030019(B2) |
申请公布日期 |
2015.05.12 |
申请号 |
US201012967962 |
申请日期 |
2010.12.14 |
申请人 |
Infineon Technologies AG |
发明人 |
Meyer Thorsten;Heitzer Ludwig |
分类号 |
H01L23/48;H01L23/31;H01L23/00 |
主分类号 |
H01L23/48 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. A semiconductor device comprising:
a redistribution layer disposed on a chip, the redistribution layer comprising a first redistribution line; an isolation layer disposed on the redistribution layer, the isolation layer having a first opening forming a first pad area; and a first interconnect located in the first opening and in contact with the first redistribution line, wherein the first redistribution line in the first pad area is routed orthogonal to a first direction to a central point and not routed parallel to an edge of the semiconductor device, and wherein the central point is a central point in a plane parallel to a main surface of the semiconductor device. |
地址 |
Neubiberg DE |