发明名称 SPUTTERING TARGET MATERIAL AND ITS MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a ceramic-made sputtering target material which has high strength and hardly cracks when being joined to a base material even when being made large-sized, and its manufacturing method.SOLUTION: A sputtering target material 10 has joint parts 19a, 19b at ceramic-made joint layers 14, 15 and two of ceramic-made division sputtering target materials 11, 12, and 13 which are joined by the ceramic-made joint layers. In the all joint parts 19a, 19b, a minimum joint area ratio as the ratio of the area of a region in an image corresponding to a region where the ceramic-made joint layer is joined to the ceramic-made division sputtering target material to the area of a region in the image corresponding to a surface of the ceramic-made division sputtering target material to which the ceramic-made joint layer is joined is 90% or higher, when the image is obtained by an X-ray transmission method. The ceramic-made division sputtering target materials are made of ITO or IGZO.</p>
申请公布号 JP2015089966(A) 申请公布日期 2015.05.11
申请号 JP20130231485 申请日期 2013.11.07
申请人 MITSUI MINING & SMELTING CO LTD 发明人 MAZAKI TAKANORI;KAWANO TOSHIAKI
分类号 C23C14/34;C04B37/00 主分类号 C23C14/34
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