| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of producing a thin film-provided substrate, e.g. a multi-layer reflection film-provided substrate, which can form reference marks at relatively low costs to execute coordinate management of defects with high accuracy.SOLUTION: A method of producing a thin film-provided substrate comprises preparing a photomask or imprint plate formed with a pattern of reference marks and at least one thin film-provided substrate serving as a to-be-transferred object, forming a resist film on the thin film-provided substrate, transferring the pattern of reference marks formed on the photomask or imprint plate to the resist film to form a resist pattern of the reference marks and removing, with the resist pattern as the mask, at least one thin film formed on the thin film-provided substrate by bringing the thin film in contact with a material in a non-excited state containing a compound of fluorine with one of chlorine, bromine, iodine and xenon. |
