SYSTEM FOR MONITORING A PROCESS

摘要

Disclosed is a system for monitoring a process. According to an embodiment of the present invention, the system for monitoring a process comprises: an exhaust line which is connected to a chamber; a monitoring line which is diverged from the exhaust line; a response formation part which is installed inside the monitoring line; and a cover which is installed inside the monitoring line so as to enclose the response formation part. The system for monitoring a process has a characteristic of monitoring the process inside the chamber based on the light generated inside the monitoring line by the response formation part. The system for monitoring a process according to the present invention is capable of remaining a vacuum state even if a process accompanying the occurrence of plasma is performed for the long term in a system wherein a semiconductor process and other processes are performed. The present invention keeps the vacuum state inside the system, thereby preventing the damage to progress equipment for semiconductor process, a system for monitoring a process, and a semiconductor wafer to be processed. Therefore, the system for monitoring a process can remarkably reduce loss costs.