| 摘要 |
The present invention relates to an imprint apparatus which performs an imprint process of forming a pattern on a substrate by molding an imprint material on a substrate. It includes a supply device which supplies a transmission gas which penetrates a mold, an imprint material and a substrate, and a condensation gas which is liquefied by pressure increase due to molding to a space between the mode and the imprint material of the substrate; and a controller which controls the supply device to change at least one of the amount of the transmission gas supplied and the amount of the condensation gas supplied, based on the information of a recipe for an imprint process. |
