| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device that is advantageous in terms of the accuracy of exposure amount and the throughput.SOLUTION: An exposure device includes a light source for radiating pulse light, and exposes a substrate with the pulse light through an original plate. Furthermore, the exposure device includes a detector for detecting the amount of pulse light, and a control unit for controlling the light source and the detector. The control unit performs first calibration for determining the relationship of the control input for the light source and the amount of pulse light from the light source, based on the amount of a plurality of pulse light beams detected in the detector by radiating a plurality of pulse light beams from the light source, in parallel with second calibration different from the first calibration, and performing by using a plurality of pulse light beams. |
