发明名称 DEVICE AND METHOD FOR SUBSTRATE FAST HEATING AND COOLING AND APPLICATION OF COATING THEREON IN VACUUM
摘要 FIELD: process engineering.SUBSTANCE: invention relates to application of coating on hot substrate in vacuum chamber. Substrate (20) is placed on holder (24) so that substrate lower surface (21a) stays in contact holder surface. Substrate (20) is lifted through distance d relative to holder. Lifted substrate is heated via its top surface (21b) with the help of heater (22). Coating is immediately applied on hot substrate to be lowered on holder (24) and substrate is cooled down. Said applicator comprises substrate holder (24) with substrate lifting device (23), substrate lower surface (21a) being located on holder (24). Heater (22) is used to heat lifted substrate (20) through its upper surface and means (29) to apply the coating on substrate (20) immediately after heating.EFFECT: fast heating and cooling for immediate coat application in the same vacuum chamber.24 cl, 6 dwg
申请公布号 RU2550464(C2) 申请公布日期 2015.05.10
申请号 RU20120140492 申请日期 2011.02.22
申请人 SINGULUS TEKNOLODZHIZ AG 发明人 MAASS,VOL'FRAM;OKKER,BERTOL'D;LANGER,JURGEN;DZHON,KHEL'MUT
分类号 C23C14/24;C23C14/54 主分类号 C23C14/24
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