发明名称 EQUIPMENT FOR EXPOSING AND DEVELOPING, AND METHOD FOR THE SAME
摘要 The present invention provides a kind of device for exposing and developing, and a method for exposing and developing. The device for exposing and developing of the present invention comprises: an edge exposure device for exposing an edge of a substrate; and a development device including the edge exposure device at an entrance thereof and for developing the exposed substrate, wherein when the substrate is transferred to the development device, the edge exposure device is allowed to proceed an edge exposure. The edge exposure device is installed in the entrance of the development device such that the edge exposure can be simultaneously completed in a process that the substrate moves toward the development device, whereby it is not necessary to transfer the substrate for several times and processes are shortened such that processing efficiency can be greatly enhanced.
申请公布号 KR20150050371(A) 申请公布日期 2015.05.08
申请号 KR20140139627 申请日期 2014.10.16
申请人 EVERDISPLAY OPTRONICS (SHANGHAI) LIMITED 发明人 HUANG YU CHIA;YANG CHINGCHE
分类号 G03F7/20;G03F7/26 主分类号 G03F7/20
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