| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition being excellent in suppressing performance of particle occurrence when the composition is stored and allowing formation of a pattern with line width variation over time being suppressed and a manufacturing method of this composition; and also to provide an actinic ray-sensitive or radiation-sensitive film using this composition and a pattern forming method. <P>SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains (A) a first resin which is decomposed by action of an acid to increase solubility in an alkali developer, (B) a compound which generates an acid by irradiation with an actinic ray or a radiation ray, and (C) at least alkylene glycol monoalkylether carboxylate as a solvent, where the total of the concentration of oxygen and the concentration of nitrogen dissolved in the composition is 0.180 μg/μl or less. <P>COPYRIGHT: (C)2013,JPO&INPIT |
