| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a charged particle beam lithography apparatus capable of inhibiting deterioration of the product quality which is caused by adhesion of foreign objects, and to provide a charged particle beam lithography method.SOLUTION: A charged particle beam lithography apparatus 1 includes: a lithography chamber 2 which houses a stage 2a supporting a sample W that is a lithography object; a robot chamber 4 which houses a robot device 4a for transporting the sample W onto the stage 2a; and an electrification member 41 which is provided along a transport path A1 of the sample W and attracts foreign objects adhering to the sample W passing through the transport path A1 by static electricity.</p> |
