发明名称 |
PROCESS-INDUCED DISTORTION PREDICTION AND FEEDFORWARD AND FEEDBACK CORRECTION OF OVERLAY ERRORS |
摘要 |
Systems and methods for prediction and measurement of overlay errors are disclosed. Process-induced overlay errors may be predicted or measured utilizing film force based computational mechanics models. More specifically, information with respect to the distribution of film force is provided to a finite element (FE) model to provide more accurate point-by-point predictions in cases where complex stress patterns are present. Enhanced prediction and measurement of wafer geometry induced overlay errors are also disclosed. |
申请公布号 |
WO2015066232(A1) |
申请公布日期 |
2015.05.07 |
申请号 |
WO2014US62992 |
申请日期 |
2014.10.29 |
申请人 |
KLA-TENCOR CORPORATION |
发明人 |
VUKKADALA, PRADEEP;CHEN, HAIGUANG;SINHA, JAYDEEP;VEERARAGHAVAN, SATHISH |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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