发明名称 |
LAMINATE, KIT FOR PRODUCING ORGANIC SEMICONDUCTOR, AND RESIST COMPOSITION FOR PRODUCING ORGANIC SEMICONDUCTOR |
摘要 |
<p>Provided are: a laminate that can form a favorable organic semiconductor pattern; a kit for producing an organic semiconductor and that is for producing the laminate; and a resist composition that is for producing an organic semiconductor and that is used in the kit for producing an organic semiconductor. The laminate has an organic semiconductor film, a protective film on the organic semiconductor film, and a resist film on the protective film, the resist film comprising a photosensitive resin composition containing the belowmentioned (1) and/or (2): (1) a compound (A1) of which the main chain is broken down by means of light irradiation at wavelengths of 100-600 nm; and (2) an activating agent (B) that generates an active species by means of irradiation at wavelengths of 100-600 nm and a compound (A2) of which the main chain is broken down by means of the activating agent (B).</p> |
申请公布号 |
WO2015064605(A1) |
申请公布日期 |
2015.05.07 |
申请号 |
WO2014JP78701 |
申请日期 |
2014.10.29 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KOYAMA ICHIRO;IWAI YU;MIZUTANI KAZUYOSHI;KAMOCHI YOSHITAKA |
分类号 |
G03F7/039;G03F7/004;G03F7/11 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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