发明名称 |
COOLING MECHANISM FOR SPUTTERING CATHODE, AND METHOD OF MANUFACTURING BASE MATERIAL FOR WIRING BOARD USING SPUTTERING DEVICE HAVING THE COOLING MECHANISM |
摘要 |
PROBLEM TO BE SOLVED: To provide a cooling mechanism for sputtering cathode that can suppress a decrease in cooling efficiency due to warpage of a target without using any complex mechanism for a sputtering device which fits the target to a base plate and cools the target indirectly.SOLUTION: A housing 1 of a sputtering cathode is fitted with a base plate 2. The base plate 2 is fitted with a target 4. A cooling medium 7 is made to flow in the housing 1, and a thickness of the base plate 2 and a pressure of the cooling medium 7 are set to suitable values. Consequently, the base plate 2 follows up deformation of the target 4 and there is no gap formed between a cooling surface 4b of the target 4 and the base plate 2, so that cooling is never insufficient. |
申请公布号 |
JP2015086449(A) |
申请公布日期 |
2015.05.07 |
申请号 |
JP20130227165 |
申请日期 |
2013.10.31 |
申请人 |
SUMITOMO METAL MINING CO LTD |
发明人 |
YOSHIO SATOSHI |
分类号 |
C23C14/34;C23C14/20;H05K3/16 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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