| 摘要 |
A mask blank for producing a transfer mask adapted to ArF excimer laser exposure light. The mask blank has a light-shielding film on a transparent substrate. The light-shielding film has a structure in which a light-shielding layer and a front-surface antireflection layer are laminated in this order from the transparent substrate. The light-shielding layer is made of a material containing tantalum and nitrogen. The front-surface antireflection layer is made of material containing tantalum and silicon and further containing one or more elements selected from oxygen and nitrogen. |
