| 摘要 |
<p>A lithographic apparatus including an optical column to project a beam on a target portion of a substrate is disclosed, the optical column having a projection system configured to project the beam onto the target portion. The apparatus further includes an actuator to move the optical column or at least part thereof with respect to the substrate and a window (940) between the moving part of the optical column and the target portion of the substrate and/or between the moving part of the optical column and a non -moving part of the optical column, the window constructed and arranged within the apparatus to reduce or minimize movement of the window.</p> |
