发明名称 CHARGED PARTICLE BEAM DEVICE
摘要 <p>If observing and analyzing a sample using a charged particle beam device, it is necessary to hold a sample (110) for a long period of time in a sample chamber (111), the sample being mounted on a sample stage (150) and disposed in the sample chamber (111). However, if the environmental temperature of the device changes, sample drift occurs due to thermal deformation of a stage case (161) that supports the sample stage (150), and the same position on the sample cannot be maintained. In the present invention, sample drift caused by environmental temperature changes is reduced by using the following: a deformation amount measurement means (211) for measuring the deformation amount of the stage case (161); a heating-cooling means (213) for heating and/or cooling the outer surface of the stage case (161); and a drift correction circuit (212) that, on the basis of the measured deformation amount, controls the operation of the heating-cooling means (213) so that a charged particle beam irradiation position with respect to the sample (110) mounted on the sample stage (150) does not move because of temperature changes in the environmental atmosphere.</p>
申请公布号 WO2015064691(A1) 申请公布日期 2015.05.07
申请号 WO2014JP78900 申请日期 2014.10.30
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 MAKI NOBUYUKI;MOMOI YASUYUKI;SUZUKI HIROYUKI
分类号 H01J37/20;H01J37/28 主分类号 H01J37/20
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