发明名称 |
LAMINATE, ORGANIC-SEMICONDUCTOR MANUFACTURING KIT, AND RESIST COMPOSITION FOR MANUFACTURING ORGANIC SEMICONDUCTOR |
摘要 |
PROBLEM TO BE SOLVED: To provide: a laminate that allows the formation of a good organic semiconductor pattern; an organic-semiconductor manufacturing kit for manufacturing the laminate; and a resist composition for manufacturing an organic semiconductor, the resist composition being used in the organic-semiconductor manufacturing kit.SOLUTION: This laminate comprises an organic semiconductor film, a protective film on top of the organic semiconductor film, and a resist film on top of the protective film. The resist film comprises a photosensitive resin composition that contains a compound (A) capable of crosslinking as a result of photodimerization reaction after light irradiation. |
申请公布号 |
JP2015087613(A) |
申请公布日期 |
2015.05.07 |
申请号 |
JP20130227041 |
申请日期 |
2013.10.31 |
申请人 |
FUJIFILM CORP |
发明人 |
KOYAMA ICHIRO;IWAI HISASHI;MIZUTANI KAZUYOSHI;KAMOCHI YOSHITAKA |
分类号 |
G03F7/027;B32B27/16;C08F16/26;C08F20/16;C08F20/26;C08F20/36;G03F7/004;G03F7/038;G03F7/11 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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