发明名称 DEVICE AND METHOD FOR SUPPLYING PROCESSING LIQUID
摘要 PROBLEM TO BE SOLVED: To provide a technique capable of collecting foreign substances in a processing liquid at a high collection rate.SOLUTION: At discharging from a nozzle 7 a processing liquid from a processing liquid vessel 60, the secondary side of a pump 70 is connected to the primary side of a filter 52, so that a resist liquid L passing through the filter 52 is returned to the supply source side, and the returned processing liquid is synthesized with a processing liquid supplemented from the processing liquid vessel 60. In at least one of the case when returning the processing liquid to a buffer tank 61 and the case when sucking the synthesized resist liquid L into the pump 70, it is made to pass through the filter 52. This enables collection of foreign substances in the processing liquid at a high collection rate, while suppressing the number of filters 52, for example, using one filter 52.
申请公布号 JP2015088702(A) 申请公布日期 2015.05.07
申请号 JP20130228580 申请日期 2013.11.01
申请人 TOKYO ELECTRON LTD 发明人 YOSHIHARA KOSUKE;TAKAYANAGI YASUHARU;KOSHO TOMONOBU;SASA TAKUSHI;ISHIMARU DAISUKE
分类号 H01L21/027;B05C11/10;B05D1/26;B05D3/00;G02F1/13 主分类号 H01L21/027
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