EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

An exposure apparatus is provided with a light source for emitting pulse light and exposes a substrate via to the pulse light an original. Further, the exposure apparatus comprises a detection unit for detecting the light quantity of the pulse light and a controller for controlling the light source and the detection unit. Here, the controller is configured to execute a first calibration process for obtaining a relation between a control input to the light source and a light quantity of a pulse light from the light source, based on light quantities of a plurality of pulse lights detected by the detector by causing the light source to emit the plurality of the pulse lights with a plurality of the control input, in parallel with execution of a second calibration process which is different from the first calibration process and executed using the plurality of pulse lights.

主权项

1. An exposure apparatus that includes a light source for emitting pulse light and exposes a substrate to the pulse light via an original, the apparatus comprising:
a detector configured to detect a light quantity of the pulse light; and a controller configured to control the light source and the detector, wherein the controller is configured to execute a first calibration process for obtaining a relation between a control input to the light source and a light quantity of a pulse light from the light source, based on light quantities of a plurality of pulse lights detected by the detector by causing the light source to emit the plurality of the pulse lights with a plurality of the control input, in parallel with execution of a second calibration process which is different from the first calibration process and executed using the plurality of pulse lights.